There are various filtering technologies and equipment involved in the semiconductor industry, which are mainly selected based on the needs of the production process and the different filtering objects. Here are some common filtering technologies and equipment in the semiconductor industry:

1、 Chemical reagent filtration

In the semiconductor manufacturing process, various inorganic or organic chemical reagents are used for wet cleaning to remove impurities attached to the surface of the chip. These reagents usually need to be filtered through equipment to remove particles and impurities before use to ensure cleaning effectiveness. Common chemical reagent filtration equipment includes:

Multi media filtration system: By combining different media, it effectively removes impurities such as suspended solids, colloids, and particulate matter from reagents.

Activated carbon filtration system: mainly used to remove organic matter, odors, pigments and other impurities in reagents, and improve the purity of reagents.

2、 Gas filtration

In the semiconductor manufacturing process, especially in processes such as thin film deposition and dry etching, ultra pure reaction gases and inert gases need to be introduced. These gases need to undergo strict filtration treatment before entering the process chamber to remove tiny particles and impurities. Gas filtration equipment typically includes:

High efficiency particulate air (HEPA) filter: capable of removing small particles from the gas, ensuring the purity of the gas.

Molecular sieve: used to remove specific molecules or ions from gases and improve gas purity.

3、 Water filtration

Semiconductor production has extremely high requirements for water quality, requiring the use of ultrapure water for key processes such as cleaning, etching, film formation, and doping. Therefore, water filtration equipment also plays an important role in the semiconductor industry. Common water filtration equipment includes:

Multi medium/activated carbon filtration system: As the initial stage of water treatment, it removes impurities such as suspended solids, colloids, and particulate matter from water.

Ultrafiltration system: using ultrafiltration membrane to remove particles and ions from water, improving the purity of water.

Reverse osmosis system (RO): By using a reverse osmosis membrane to remove impurities such as soluble salts, heavy metals, and organic matter from water, ultrapure water is prepared.

Electrodeionization system (EDI): further removes ions and other impurities from water, improves the purity of ultrapure water, and meets the high requirements of semiconductor manufacturing.

4、 Other filtering technologies

In addition to the common filtering technologies and equipment mentioned above, the semiconductor industry may also adopt other advanced filtering technologies, such as:

Nanofiltration technology: Using the different pore sizes of nanofiltration membranes, large molecular substances and ions in wastewater are separated.

Centrifugal filtration technology: using centrifugal force to separate suspended solids and particulate matter from wastewater.

Biological filtration technology: By the action of microorganisms, organic matter in wastewater is decomposed into inorganic matter, achieving the goal of purifying water quality.

In short, there are numerous types of filtering technologies and equipment in the semiconductor industry, and choosing the appropriate filtering technology and equipment is crucial for ensuring the performance and quality of semiconductor products. With the continuous development of technology, new filtering technologies and equipment will also emerge, providing strong guarantees for the sustainable development of the semiconductor industry.